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Low-loss coupling interfaces between InP-based emitters and Si_3N_4 photonic integrated circuits

机译:基于InP的发射器与Si_3N_4光子集成电路之间的低损耗耦合接口

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Silicon photonics technology has emerged as a viable solution for the demonstration of highly functional PhotonicIntegrated Circuits (PICs) relying on the mixture of light sources with silicon based waveguides. However, theincorporation of the laser sources in all PICs has always been at the center of industrial and research attention. To date,the vast majority of such merging schemes focus on either flip chip bonding of external Ⅲ-Ⅴ dies or hybrid-integrationtechniques that feature very good optical performance at the expense of fabrication cost. The next evolution of PICs,however will rely on the monolithic integration of the Ⅲ-Ⅴ lasers on the silicon substrates for simultaneous optimizationof cost and circuit performance. In this work two low-loss coupling interface schemes are presented for efficient lighttransition between monolithically integrated InP-based laser sources and a Si_3N_4 passive circuitry through anintermediate waveguiding layer. For both coupling interface schemes, the light is butt-coupled from the Ⅲ-Ⅴ source intoan intermediate waveguide that in turn couples the light into the final Si_3N_4 waveguide platform utilizing an evanescentcoupling scheme. Two approaches are investigated towards this direction: The first approach is based on a purelystoichiometric Si_3N_4 waveguide, while the second one is based on a Si-Rich Nitride (SRN) acting as the intermediatelayer. In both cases 2D-FDTD simulations verified by 3D-FDTD simulation results reveal total transition losses of lessthan 1.7dB for the pure-Si_3N_4 and less than 1dB for the SRN approach.
机译:硅光子技术已成为一种可行的解决方案,用于展示依赖于光源和硅基波导混合的高功能光子集成电路(PIC)。但是,在所有PIC中集成激光源一直是工业和研究关注的焦点。迄今为止,绝大多数此类合并方案都集中在外部Ⅲ-Ⅴ模的倒装芯片键合或具有非常好的光学性能,但以制造成本为代价的混合集成技术中。 PIC的下一个发展将\\\\\\\\\\\\\\\\\\\\\\出售的签购都取决于Ⅲ-Ⅴ激光器在硅衬底上的单片集成,以同时优化成本和电路性能。在这项工作中,提出了两种低损耗耦合接口方案,以通过单波导中间层在单片集成的基于InP的激光源和Si_3N_4无源电路之间实现高效的光跃迁。对于这两种耦合接口方案,光从Ⅲ-Ⅴ源对接耦合到\ r \ nan中间波导中,该波导又利用e逝子\ r \ n耦合方案将光耦合到最终的Si_3N_4波导平台中。朝这个方向研究了两种方法:第一种方法基于纯化学计量的Si_3N_4波导,而第二种方法则基于充当中间层的富硅氮化物(SRN)。在这两种情况下,通过3D-FDTD仿真结果验证的2D-FDTD仿真都表明,纯Si_3N_4的总过渡损耗小于1.7dB,而SRN方法的总过渡损耗小于1dB。

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  • 来源
    《Silicon Photonics XIV》|2019年|109231J.1-109231J.8|共8页
  • 会议地点 0277-786X;1996-756X
  • 作者单位

    School of Physics, Aristotle University of Thessaloniki, Greece Center for Interdisciplinary Research and Innovation, Aristotle University of Thessaloniki, Greece;

    Department of Informatics, Aristotle University of Thessaloniki, Greece Center for Interdisciplinary Research and Innovation, Aristotle University of Thessaloniki, Greece;

    Department of Informatics, Aristotle University of Thessaloniki, Greece Center for Interdisciplinary Research and Innovation, Aristotle University of Thessaloniki, Greece;

    School of Physics, Aristotle University of Thessaloniki, Greece Center for Interdisciplinary Research and Innovation, Aristotle University of Thessaloniki, Greece;

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