Plasma and Chemical Treatments of Polyimide 'Sacrificial' Layers in Processing of Microbolometrs

摘要

Methods and objectives of plasma and chemical treatments of thin polyimide (PI) coatings used as "sacrificial" layers in microbolometer processing have been analysed. Physical and chemical effects and mechanisms of surface plasma and chemical treatment of PI layers and their anisotropic plasma etching with given wall sloping angles and from a gap have been integrated. Revealed mechanisms enabled to optimize PI plasma and chemical treatment parameters in processing of microbolometer matrices of sizes 2x48, 160x120 and 320x240 pixels.