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Interfacial control for developing organic rewritable optical memory using organic photo-FET having photosensitive gate dielectric

机译:使用具有光敏栅极电介质的有机光FET来开发有机可重写光学存储器的界面控制

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We have already reported on the pentacene photo FET having a photo-sensitive gate dielectric layer (poly(N-vinylcarbazole):PVK). This photo FET showed excellent photo-switching properties upon illuminating the gate dielectric layer, because the gate capacitor was rapidly charged up by providing a large amount of photo-generated charges in the dielectric layer to the gate capacitor. When the gate bias and photo-illumination were turned off, accumulated charges diffuse from the channel region to the source electrode and the channel immediately becomes OFF state. Therefore, this photo FET can switch ON-OFF states rapidly, however, memory property is poor. In this study, we have tried to give a memory function to the photo FET. For keeping the accumulated charges at the channel region even after turning off the gate bias and photo-illumination, we intentionally formed Schottky barriers at the interface between the semiconductor and the DS electrodes by using aluminum as a low work function metal instead of gold. As a result, the photo FET did not show any gate voltage modulations of drain currents under dark condition. On the other hand, the photo FET showed the drastic increase in drain current upon illuminating the gate dielectric layer. Further, this high-drain current state was kept even after turning off the gate bias and photo-illumination (written state), probably because the accumulated charges at the channel region could not escape from the source electrode owing to the Schottky barrier at the semiconductor/DS electrodes interface. From these results, we have concluded that we could develop the novel organic rewritable optical memory.
机译:我们已经报道了具有光敏栅介电层(聚(N-乙烯基咔唑):PVK)的并五苯光电FET。由于通过在介电层中向栅极电容器提供大量光生电荷,栅极电容器被快速充电,因此该光FET在照亮栅极介电层时显示出优异的光开关性能。当栅极偏压和光致照明关闭时,累积的电荷从沟道区域扩散到源电极,并且沟道立即变为截止状态。因此,该光电FET可以快速切换ON-OFF状态,但是存储性能很差。在这项研究中,我们试图为光电FET提供存储功能。为了即使在关闭栅极偏压和光照明之后仍将沟道区的电荷保持在沟道区,我们有意通过使用铝作为低功函数金属而不是金来在半导体和DS电极之间的界面处形成肖特基势垒。结果,在黑暗条件下,光电FET并未显示任何漏电流的栅极电压调制。另一方面,光电FET在照亮栅极介电层时显示出漏极电流的急剧增加。此外,即使在关闭栅极偏压和光致照明之后,仍保持这种高漏极电流状态(写入状态),这可能是由于由于半导体上的肖特基势垒,沟道区中积累的电荷无法从源电极逸出的缘故/ DS电极接口。从这些结果,我们得出结论,我们可以开发新颖的有机可重写光学存储器。

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