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7 MBE Growth of Mercury Cadmium Telluride

机译:7 MBE碲化镉汞的生长

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摘要

The molecular beam epitaxy (MBE) growth technique for mercury cadmium telluride (MCT), the in situ characterization techniques used, and the present status of achievable material quality are reviewed here. The issues remaining to be solved before MBE-grown MCT can reach its full potential for IR devices include substrate issues, p-doping, and reducing defect densities. Emphasis is placed on these issues, with the exception of substrate issues, which are discussed in Chapter 4.
机译:本文回顾了碲化汞镉(MCT)的分子束外延(MBE)生长技术,所用的原位表征技术以及可获得的材料质量的现状。在MBE生长的MCT完全发挥其IR设备潜力之前,尚需解决的问题包括衬底问题,p掺杂和降低缺陷密度。除第4章中讨论的基材问题外,重点放在这些问题上。

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