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Compositional uniformity control on deposition of magneto-optical disk

机译:磁光盘沉积的成分均匀性控制

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Abstract: The rare earth-transition metal (RE-TM) alloys are widely accepted as the most suitable material for magneto-optical (MO) recording. The magnetic and optical properties of the recording media, hence the read-write-erase characteristics of the disk, are crucially dependent on the composition of the RE-TM films. Tailoring the composition of the films to meet the requirements in various magneto-optical recording applications is, therefore, important. In-line sputtering is the most common method for RE-TM film coating in disk production process. There are two common methods for fabricating sputter target; one is powder-sintering, the other is melt-casting. The former method yields a target composed of mixtures of pure element phases and certain percentage of intermetallic compound phases, the latter method yields a target composed of 100% intermetallic compound phases. The sputtering of RE-TM target often gives nonuniform composition distribution on the disk based on past experiences. This problem motivated us to study the sputtered atom distribution of the targets which were fabricated by different methods. !6
机译:摘要:稀土过渡金属(RE-TM)合金已被广泛接受为最适合磁光(MO)记录的材料。记录介质的磁性和光学性质,因此磁盘的读写特性,在很大程度上取决于RE-TM膜的成分。因此,调整膜的组成以满足各种磁光记录应用的要求非常重要。在线溅射是在磁盘生产过程中最常见的RE-TM薄膜涂层方法。有两种常见的制造溅射靶的方法:一种是粉末烧结,另一种是熔铸。前一种方法产生由纯元素相和一定百分比的金属间化合物相的混合物组成的靶,后一种方法产生由100%金属间化合物相组成的靶。根据过去的经验,溅射RE-TM靶通常会使磁盘上的成分分布不均匀。这个问题促使我们研究通过不同方法制造的靶材的溅射原子分布。 !6

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