Measurements from a novel interferometer for EUVL mirror substrates

摘要

A previously reported interferometer without intermediate optics is used to perform measurements on an aspherical extreme ultraviolet lithography mirror substrate. Acousto-optic modulation based phase shifting is used together with a novel phase retrieval algorithm to retrieve the phase distribution from our interferograms. The phase distribution is then processed by a previously reported inverse propagation algorithm to give the shape of the mirror under test. Our results are compared with measurements performed with conventional Fizeau interferometry and the discrepancies are discussed with reference to systematic error sources inherent in the classical and novel interferometers.