A Highly Reliable Pattern Transfer of Hydrogen Silsequioxane

摘要

In this paper, we focus on the effects of process parameters on pattern embossing into HSQ films, and the pattern degradation of HSQ for room temp erature aging effects. We used MIBK to dilute HSQ (FOx15, Dow Corning) to control the film thickness. NX-1000 (Nanonex) was used to imprint HSQ embossed with Si grating mold at 25～180℃ under 2～2.5MP. The experiment results show the HSQ films diluted with MIBK become more suitable for imprinting. In order to get fidelity replication, the optimum process parameters can be determined. The dilute HSQ is prebaked at 150℃ for 3 min and imprinted at 180℃ for 2 min under the pressure of 2.5 MPa. This sample also shows no degradation in replication patterns after aging at room temperature for 20 days.