Ultimate Limits to Optical Displacement Detection in Nanoelectromechanical Systems

摘要

We describe an optical technique for the detection of displacement in Nanoelectromechanical Systems (NEMS). The technique is based upon path stabilized optical interferometry. We evaluate the effectiveness of this technique in NEMS by detecting displacements from a series of doubly clamped beam resonators with decreasing dimensions. Our measurements and analyses indicate that the technique tends to become less effective beyond the optical diffraction limit.