【24h】

SUPER SILICON INITIATIVE AND FUTURE LARGE WAFER SIZE DIAMETERS

机译:超级硅引发剂和未来的大晶圆尺寸直径

获取原文
获取原文并翻译 | 示例

摘要

The Super Silicon project for the future large silicon wafer of 400 mm diameter, namely the SSi project, started in 1996 and its R&D activities completed in 2000. Through the experiences of this project, three keys to the crystal growth technology for the future large diameter silicon wafers are introduced and discussed: the equipments for large diameter silicon crystals, the growth conditions of large-sized crystals, and the material innovation like quartz crucibles. The CZ furnaces with crystal supporting system can be applied to the future larger diameter silicon crystals. The growth and quality control of the crystals are also technologically optimistic. Infra-structure like quartz crucibles seems not to become a bottle neck until 450 mm diameter era. The feasibility study on cost issues has never been done and will be required for commercial production.
机译:用于未来的400 mm直径大型硅晶片的Super Silicon项目,即SSi项目,始于1996年,其研发活动于2000年完成。通过该项目的经验,未来大直径晶体生长技术的三个关键介绍并讨论了硅晶片:大直径硅晶体的设备,大尺寸晶体的生长条件以及诸如石英坩埚之类的材料创新。具有晶体支撑系统的CZ熔炉可应用于未来更大直径的硅晶体。晶体的生长和质量控制在技术上也是乐观的。直到450毫米直径的时代,像石英坩埚这样的基础设施才不会成为瓶颈。成本问题的可行性研究尚未完成,将需要进行商业生产。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号