DEPOSITION OF SUB-MICRON Ni DROPLETS ON GLASS SUBSTRATES BY A COMBINATION OF PLASMA ASSISTED CVD AND PVD

摘要

In the present study, Ni coatings have been deposited on glass microscope slides at substrate temperatures of 300, 350, 400 and 450℃. The depositions were performed by evaporating the metallic Ni source in a low-voltage (600-1000V) plasma of argon:hydrogen (2:1) gas. Morphology of the Ni coatings was altered by changing the substrate temperature whereas the coating thickness was kept nearly constant. X-ray and XPS analyses showed that the increase in the substrate temperature resulted in the formation of NiO and Ni_2O_3 on the deposited layer. Resistivity of the deposited layers and the adhesion between the substrate and coatings were increased at high temperatures.