Plasma-assisted chemical deposition process (CVD) with remote excitation of an excitation gas (remote plasma CVD process) for coating or for treating large-area substrates and device for carrying out the same

摘要

The remote plasma CVD process coats or treats substrates with a large area. Excitation of the reaction gas in this process takes place by an excitation gas produced by means of a plasma which is remote from the substrate surface to be coated. The excitation gas is produced in several modular plasma sources assembled as remote line or surface arrays, and is delivered together with the reaction gas to the substrate. Also claimed is an apparatus for the above process.