Fraunhofer Institute of Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany;
Fraunhofer Institute of Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany;
Fraunhofer Institute of Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany;
Fraunhofer Institute of Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany;
Institute of Micro- and Nanotechnologies, Technical University Ilmenau, 98693 Ilmenau, Germany;
Institute of Micro- and Nanotechnologies, Technical University Ilmenau, 98693 Ilmenau, Germany;
Institute of Micro- and Nanotechnologies, Technical University Ilmenau, 98693 Ilmenau, Germany;
Institute of Micro- and Nanotechnologies, Technical University Ilmenau, 98693 Ilmenau, Germany;
group Ⅲ nitrides; microelectromechanical systems; piezoelectric actuation; resonator;
机译:适用于MEMS和NEMS应用的基于AlGaN / GaN的异质结构
机译:AlGaN的Cl_2基电感耦合等离子体刻蚀对Al_2O_3 / AIGaN / GaN异质结构界面性能的影响
机译:适用于MEMS / NEMS应用的InAs / AlGaSb异质结构位移传感器
机译:基于AlGaN / GaN的MEMS和NEMS应用的异质结构
机译:AIGaN / GaN基气体传感器中电极催化反应的电响应的表征和建模。
机译:新型MEMS / NEMS的3D异质结构和系统
机译:AIGAN / GAN异质结构的蓝宝石底物上GAN EPI层的电气特性