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The analysis and structural design of micro SOI pressure sensors

机译:微型SOI压力传感器的分析与结构设计

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A kind of micro piezoresistive pressure sensor with stable performances under high temperature is designed based on the silicon on insulator (SOI). Through analyzing the stress distribution of diaphragm by finite element method (FEM), the model of structure was established. The fabrication operated on SOI wafer, which can be used in extreme high temperature environments, and applied the technology of anisotropy chemical etching. Performances of this kind of SOI piezoresistive sensor, including size, sensitivity, and temperature were investigated. The result shows that the precision is 0.57% FS. Therefore, this kind of design not only has smaller size, simplicity preparation but also has high sensitivity, temperature coefficient and accuracy.
机译:基于绝缘体上硅(SOI),设计了一种在高温下性能稳定的微压阻式压力传感器。通过有限元分析膜片的应力分布,建立了结构模型。该工艺在SOI晶圆上进行,可在极端高温环境中使用,并应用了各向异性化学蚀刻技术。研究了这种SOI压阻传感器的性能,包括尺寸,灵敏度和温度。结果表明,精度为0.57%FS。因此,这种设计不仅具有较小的尺寸,简单的制备方法,而且具有较高的灵敏度,温度系数和精度。

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