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Magnesium-silicide-based multilayers for soft x-ray optics

机译:用于软X射线光学器件的基于硅化镁的多层膜

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Abstract: Using a diode rf-sputtering technique, differentmagnesium silicide based multilayer systems have beendeposited in very thin films for optical applicationsin the soft x-ray range. A detailed structural analysisof the different multilayers has been made usingin-situ kinetic ellipsometry, ex-situ grazing x-rayreflection at the copper K-$alpha line and transmissionelectron microscopy. The multilayer performances havebeen measured by synchrotron radiation at the magnesiumK-$alpha and L-$alpha lines and related to thestructural characteristics. For short wavelength, theW/Mg$-2$/Si system shows characteristics very similarto those of the more common W/Si system. Non-negligibleinterdiffusion and limited interface roughness allowthe layer thicknesses to be reduced to very low values.Well-defined Bragg peaks are observed even when thedouble period is as low as 44 angstrom. First Braggpeak reflectivity as high as 31% has been measured at9.89 angstrom for a multilayer with a double periodequal to 84 angstrom and a limited number of periods.This preliminary result is very promising for futureapplications in the field of x-ray fluorescenceanalysis. W/Mg$- 2$/Si and Si$-3$/N$-4$//Mg$-2$/Simultilayers have also been fabricated for use at higherwavelengths around the Mg L-$alpha line (286 angstrom).In the case of the W/Mg$-2$/Si multilayers have alsobeen fabricated for use at higher wavelengths aroundthe Mg L-$alpha line (286 angstrom). In the case of theW/Mg$-2$/Si system, the tungsten layers arecrystallized due to their higher thickness andconsequently the interface roughness is slightlyhigher. In spite of this, more than 20% reflectivity atthe first Bragg peak has been measured at normalincidence on different W/Mg$-2$/Si samples, with aselectivity two times better than conventional Mo/Simirrors ($lambda@/$delta $lambda $APEQ 20). When wereplace tungsten by a thin silicon nitride layerdeposited by reactive sputtering, we increase theselectivity up to $lambda@/$delta $lambda $APEQ 30, andthe thermal stability is drastically improved ($GRT800$DGR@C). !23
机译:摘要:使用二极管射频溅射技术,已将基于硅化镁的多层系统沉积在非常薄的薄膜中,以用于软X射线范围内的光学应用。使用原位动力学椭偏仪,铜K-αα线的异位放牧X射线反射和透射电子显微镜对不同的多层材料进行了详细的结构分析。多层性能已经通过在镁K- $α和L- $α线的同步加速器辐射测量并且与结构特性有关。对于短波长,W / Mg $ -2 $ / Si系统显示出与更常见的W / Si系统非常相似的特性。不可忽略的相互扩散和有限的界面粗糙度使层厚度可以减小到非常低的值。即使当双周期低至44埃时,也能观察到清晰的布拉格峰。对于双层等于84埃且周期数有限的多层膜,其第一布拉格反射率高达9.89埃,已被测出,这一初步结果对于在X射线荧光分析领域的未来应用非常有希望。 W / Mg $-2 $ / Si和Si $ -3 $ / N $ -4 $ // Mg $ -2 $ / Si多层膜也已经制造出来,可用于Mg L- $ alpha线(286埃)附近的更高波长对于W / Mg $ -2 $ / Si,还可以制造多层膜,以用于Mg L- $ alpha线(286埃)附近的更高波长。在W / Mg $ -2 $ / Si体系的情况下,钨层由于其较高的厚度而结晶,因此界面粗糙度略高。尽管如此,在不同的W / Mg $ -2 $ / Si样品的法向入射下,在第一个布拉格峰测量的反射率超过20%,其选择性是传统Mo / Simirrors的两倍($ lambda @ / $ delta $ lambda $ APEQ 20)。当通过反应溅射沉积的薄氮化硅层代替钨时,我们将选择性提高到$ lambda @ / $ delta $ lambda $ APEQ 30,并且热稳定性得到了显着改善($ GRT800 $ DGR @ C)。 !23

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