首页> 外文会议>MRS spring meeting symposium >Spontaneous and Piezoelectric Polarization Effects on the Frequency Response of Wurtzite Aluminium Gallium Nitride / Silicon Carbide Heterojunction Bipolar Transistors
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Spontaneous and Piezoelectric Polarization Effects on the Frequency Response of Wurtzite Aluminium Gallium Nitride / Silicon Carbide Heterojunction Bipolar Transistors

机译:自发和压电极化对纤锌矿型氮化铝镓/碳化硅异质结双极晶体管的频率响应的影响

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We present theoretical calculations for the effect of spontaneous and piezoelectric polarization on the base resistance and frequency response of wurtzite Aluminium Gallium Nitride / Silicon Carbide Heterojunction Bipolar Transistors. Heterojunction Bipolar Transistors ( HBTs ) built using wide band gap semiconductors with AlGaN emitter and SiC base/collector hold the promise of high-power and high-frequency operation due to lower impact ionization coefficients and higher breakdown voltages. Further, Silicon Carbide has an indirect bang gap, and a large lifetime of minority carriers compared to most other compound semiconductors, which tend to have direct band gaps. This reduces the base recombination factor when the base is made from SiC, and helps to achieve higher overall current gain. Spontaneous and piezoelectric polarizations of the order of 10~(13) electrons per cm~2 exist in wurtzite wide band-gap semiconductors. This has a non-trivial effect on band profile, charge transport and overall device characteristics since the polarization-induced charges are of the same order of magnitude as the total dopant charge content of critical device layers, and can significantly affect the amount of mobile charge depletion or accumulation in these layers. We calculate the effect of this polarization for both very thin pseudomorphic emitters and for relaxed emitter structures. We present calculations for the cases of Si-face and C-face SiC, since the signs of polarization-induced charges are different for the two cases. The intrinsic base resistance near emitter flat-band conditions is changed by about a factor of 10 depending on the alloy composition of the emitter and the polarity of growth. The maximum frequency of oscillation under emitter flat-band conditions can also be modulated by the polarization-induced charges by up to 60%. Our calculations show that the technologically less prevalent C-face SiC can give a higher advantage for frequency response, especially when the emitter thickness is larger than the critical thickness.
机译:我们介绍了自发极化和压电极化对纤锌矿型氮化铝镓/碳化硅异质结双极晶体管的基极电阻和频率响应的影响的理论计算。使用具有AlGaN发射极和SiC基极/集电极的宽带隙半导体构建的异质结双极晶体管(HBT)由于较低的碰撞电离系数和较高的击穿电压而具有高功率和高频工作的希望。此外,与多数具有直接带隙的大多数其他化合物半导体相比,碳化硅具有间接爆炸间隙,并且少数载流子的寿命较长。当基极由SiC制成时,这会降低基极的复合因子,并有助于实现更高的总电流增益。在纤锌矿宽带隙半导体中,存在自发极化和压电极化,每平方厘米10〜(13)个电子。由于极化感应电荷与关键器件层的总掺杂剂电荷含量处于相同的数量级,因此这对频带分布,电荷传输和整个器件特性没有重要的影响,并且会显着影响移动电荷的数量。在这些层中耗尽或积累。我们为非常薄的伪晶发射体和松弛的发射体结构计算了这种极化的影响。由于两种情况下极化感应电荷的符号不同,因此我们对Si面和C面SiC的情况进行了计算。取决于发射极的合金成分和生长的极性,接近发射极平带条件的本征基极电阻会改变约10倍。在发射器平带条件下的最大振荡频率也可以由极化感应的电荷调制高达60%。我们的计算表明,技术上较不普及的C面SiC可以在频率响应方面提供更高的优势,尤其是在发射极厚度大于临界厚度时。

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