Northrop Grumman Corp., Redondo Beach, CA, USA;
III-V semiconductors; gallium compounds; high electron mobility transistors; low noise amplifiers; wideband amplifiers; AlGaN-GaN; dual-gate HEMT; frequency 0.3 GHz to 4 GHz; frequency 1.2 GHz to 1.8 GHz; frequency 300 MHz to 3 GHz; frequency amplifier; gain 17.7 dB; low noise amplifier; microstrip amplifier; size 0.18 micron; ultra wideband GaN; GaN HEMT; LNA; broadband amplifier;
机译:采用0.1μmT栅极高电子迁移率晶体管(HEMT)工艺的18-31 GHz GaN宽带低噪声放大器(LNA)
机译:基于GaN HEMT的超宽带功率放大器的设计与制造
机译:基于GaN HEMT的超宽带功率放大器的设计与制造
机译:超宽带GaN双门HEMT低噪声放大器的设计与分析
机译:使用AlGaN / GaN HEMT的大功率,宽带微波F类功率放大器的设计
机译:用于软件无线电的连续可调低噪声放大器的设计与分析
机译:用于收发器前端的宽带平衡AlGaN / GaN HEMT MMIC低噪声放大器