A novel process for the fabrication of microstructures half the listed minimum feature size of a direct-write laser lithography system

摘要

A method for fabricating structures half the size of the listed minimum feature size of a direct-write laser lithography system was demonstrated by taking advantage of the offset spacing allowed between write paths of the machine. This unique process allows microelectromechanical systems (MEMS) structures to be fabricated with minimum features smaller than equipment specifications. This method provides an increase in the capability of a lab without having to go through the cost and effort of re-tooling in order to provide the same capabilities. This ability will allow for the design and fabrication of structures, such as sensors, with an increased degree of sensitivity over those previously designed and fabricated with the same equipment. This new process resulted in 500 nanometer wide beams which half the size of the minimum feature size specified for our equipment.