Fabrication of Nanometer Sized Features on Non-Flat Substrates Using a Nano-Imprint Lithography Process

摘要

The Step and Flash Imprint Lithography (S-FILTM) process is a step and repeat nano-imprintlithography (NIL) technique based on UV curable low viscosity liquids. Generally nano-imprintlithography (NIL) is a negative acting process which makes an exact replica of the imprint mold and issubsequently dry developed to reveal the underlying substrate material. The authors have demonstrated anovel imprint process, which reverses the tone of the imprint and enables dry develop on nonflat waferswith good critical dimension control and resist layer thickness. This positive acting NIL process termedSFIL/RTM(reverse tone S-FIL), enables nano-imprinting over intrinsic substrate topology of the typecommonly found on single side polished substrates. This paper describes the SFIL/R process and theresults of pattern transfer on single side polished silicon wafers.