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Copper electrodeposition on carbon film electrodes

机译:碳膜电极上的铜电沉积

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摘要

The reaction and nucleation mechanisms of the electrodeposition of copper from ammoniacal solutions were investigated by cyclic voltammetric and chronoamperometric techniques on carbon film electrodes in an ammoniacal bath. The process of copper formation is carried out in two steps. The first is associated to reduction of complex couple Cu(NH_3)_4~(2+) to Cu(NH_3)_2~+ this processes is controlled by diffusion, whereas in second correspond to the reduction of Cu(NH_3)_2~+ to Cu(0) in wide potential range. Theoretical models of electrocrystallization reported in literature were used to analyze the experimental current transients. The analysis of the experimental current transients shows a three-dimensional growth (3D) for the metallic copper with a great number of monolayer; this indicated that in these experimental conditions of work massive copper deposits was obtained.
机译:通过循环伏安法和计时电流法研究了氨浴中碳膜电极上铜从氨溶液中电沉积的反应和成核机理。铜的形成过程分两个步骤进行。第一个与Cu(NH_3)_4〜(2+)的复合对还原为Cu(NH_3)_2〜+有关,该过程受扩散控制,而第二个与Cu(NH_3)_2〜+还原为Cu(0)在宽电位范围内。文献报道的电结晶理论模型用于分析实验电流瞬变。对实验电流瞬态的分析表明,具有大量单层的金属铜的三维生长(3D);这表明在这些实验工作条件下,获得了大量的铜沉积物。

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