Fabrication of Large Area, 70 nm pitch nanograting patterns by Nanoimprint Lithography Using Flexible Polymer Stamp

摘要

Flexible polymer stamps are considered as an attractive alternative to rigid,brittle and expensive stamps made of inorganic materials because of their low cost and ease of fabrication. In this paper, we present a nanoimprint process to fabricate large area, high-resolution nanograting patterns using flexible polymer stamp made from ethylene-tetrafluoroethylene (ETFE). The flexibility and low surface energy of ETFE provide a clean release without fracture or deformation of the stamp and of the replicated nanograting. Large-area, high-density nanograting patterns with good shape homogeneity and size uniformity have been successfully fabricated using the ETFE stamp with advantages of its good conformal contact and low adhesion. Using ETFE stamps can resolve many serious issues in NIL and therefore can bring it to real industrial applications.