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Piezoelectric hetero-junction tunnel FET with staggered gap at off-state and broken gap at on-state

机译:压电异质结隧道FET,在禁区断开间隙和断裂间隙

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Here we propose a novel GaSb/InAs piezoelectric hetero-junction tunnel FET (PE-H-TFET) where the effective tunneling gap is modulated by gate-voltage controlled dynamic strain. In this design, the proposed PE-H-TFET changes the hetero-junction type during switching. Two design options of PE-H-TFET are proposed for different fin widths to achieve staggered gap at OFF-state and broken gap at ON-state. Source overlap is adopted to obtain a larger transition to broken gap so that an even higher ON current. The simulation results with NEGF method suggest that the proposed PE-H-TFET achieves 1.8 times enhancement of ION and a steep SS of 43 mV/decade. The source overlap obtains 2.5 times ON current gains.
机译:在这里,我们提出了一种新的Gasb / Inas压电杂隧道隧道FET(PE-H-TFET),其中通过栅极电压控制的动态应变调制有效隧道间隙。在这种设计中,所提出的PE-H-TFET在切换过程中改变异质接线类型。提出了PE-H-TFET的两个设计选项,用于不同的翅片宽度,以在禁区处实现交错差距和在状态下破碎的间隙。采用源重叠来获得更大的转换到破碎的间隙,使得电流甚至更高。 NegF方法的仿真结果表明,建议的PE-H-TFET实现了1.8倍的增强上 和43 MV /十年的陡峭。源重叠在当前收益上获得2.5倍。

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