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High voltage thick SOI-LIGBT with high current density and latch-up immunity

机译:高压厚SOI-LIGBT,具有高电流密度和闩锁免疫力

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摘要

A high voltage SOI-LIGBT with high current capability and latch-up immunity is proposed in this paper. The proposed SOI-LIGBT features the segmented U-shaped N emitter and the `JFET'-region is surrounded by the U-shaped channel. The U-shaped channel significantly enhances the electron injection from the emitter to the N-drift region, which leads to an improvement on the current density. Meanwhile, the P emitter between the adjacent U-shaped N emitters forms an additional hole current path, which is beneficial to the latch-up immunity. The experiments demonstrate that the proposed SOI-LIGBT exhibits a high current density (J) of 240A/cm at V = 3V and V = 5V, a low specific on-resistance (R) of 1.25Ω·mm with breakdown voltage (BV) of 590V. The saturation current is about 550A/cm at V = 500V without latch-up issue.
机译:本文提出了具有高电流能力和闩锁免疫力的高压SOI-LIGBT。所提出的SOI-LIGBT具有分段的U形N发射器和`JFET'区域被U形通道包围。 U形通道显着增强了从发射极到N漂移区的电子注入,这导致电流密度的改善。同时,相邻的U形发射器之间的P发射器形成额外的孔电流路径,这对闩锁免疫有益。实验表明,所提出的SOI-LIGBT在V = 3V和V = 5V下表现出240A / cm的高电流密度(j),具有击穿电压(BV)的低特定导通电阻(R)为1.25Ω·mm 590V。饱和电流在V = 500V处约为550A / cm而无锁定问题。

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