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Nanostep and Film-coatings thickness traceability

机译:纳米杆和薄膜涂层厚度可追溯性

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Nanosteps are important features in nanometrology. They are used for comparison of measurement accuracy in nanometer range at different laboratories and countries with different measurement methods. However, the nanosteps usually used for these purposes have both flats of the same material (homogeneous), which do not reveal the possible bias in measurement uncertainty for different measurement methods. The latter is especially important for measurement traceability of thin coating nanosteps on different substrates (heterogeneous). We have found that combined (homogeneous/heterogeneous) standards are more effective in traceability flowcharts. In addition, non-informative influence quantities and statistically evaluated surface roughness should be limited or compensated in thin film-coating thickness measurements. The consistency criterion can show the bias between different interferometric, contact stylus, and atomic force microscopy (AFM) measurement systems. However, this criterion is a conditional one. The contact measurements with small measuring force are more consistent for the heterogeneous nanosteps than are the interferometric non-contact measurements. We have proved also that AFM rectangular cantilever has different bending constants at higher more sensitive modes, which is important in permanent and tapping applications within the repulsive (contact) and attractive (non-contact) regimes. Besides that, the real coatings and substrates may have significant surface roughness (technological and functional), which can change the contact deformation and adhesion. We have derived simple theoretical proportions between the true RMS (R_(q)) and mean arithmetic (R_(a)) roughness parameters at different statistical distributions of irregularities and surface profiles, and compared them to the experimental data. These and other presented developments are helpful for improving traceability in the thin film-coatings thickness measurement.
机译:Nanosteps是纳米术学中的重要特征。它们用于在不同实验室和具有不同测量方法的国家的纳米范围内测量精度的比较。然而,通常用于这些目的的纳米胸部具有相同材料(均匀)的平面,其在不透露不同测量方法的测量不确定度中的可能偏置。后者对不同基材(异质)上的薄涂层纳米物质的测量可追溯性尤为重要。我们发现组合(均匀/异质)标准在可追溯性流程图中更有效。另外,在薄膜涂层厚度测量中,应限制或补偿非信息影响量和统计学评估的表面粗糙度。一致性标准可以显示不同干涉,触控笔和原子力显微镜(AFM)测量系统之间的偏压。然而,该标准是条件的。具有小测量力的接触测量对于非均相的纳米仪更加一致,而不是干涉式非接触测量。我们还证明了AFM矩形悬臂具有更高的更敏感模式的弯曲常数,这在令人厌恶(接触)和有吸引力(非接触)制度中的永久性和攻丝应用中是重要的。除此之外,真实涂层和基材可能具有显着的表面粗糙度(技术和功能),其可以改变接触变形和粘合力。在不同统治和表面轮廓的不同统计分布下,我们在真正的rms(r_(q))和平均算术(r_(a))粗糙度参数之间衍生出简单的理论比例,并将它们与实验数据进行比较。这些和其他呈现的发展有助于提高薄膜涂层厚度测量的可追溯性。

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