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Effects of substrate ion bombardment on characteristics of vacuum-arc plasma deposited hard coatings

机译:基材离子轰击对真空弧等离子体沉积硬涂层特性的影响

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This work aims to investigate the influence of the energy and flux of the ions striking the substrate on the characteristics of the ZrCN coatings deposited by cathodic arc method. The coatings were investigated for elemental and phase composition, chemical binding state, texture, residual stress, hardness, adhesion and tribological behavior using GDOS, Raman spectroscopy and XRD techniques, surface profilometry, hardness and scratch adhesion measurements, and tribological tests. Various substrate current densities (in the range 2 – 7 mA/cm2) were obtained by using 1 or 2 cathodes, while different ion energies resulted from the variation of the substrate negative bias voltage (in the range 50 – 200 V). Chemical bonds, texture, mechanical and tribological characteristics of the films were observed to strongly depend on the ion bombardment conditions. The dominant factor in achieving high hardness values (in excess of 40 GPa) and superior wear resistance was found to be the substrate current density.
机译:这项工作旨在探讨离子撞击基板的能量和通量对通过阴极弧法沉积的ZrCN涂层的特性的影响。使用GDO,拉曼光谱和XRD技术,表面轮廓测定法,硬度和划痕粘附测量和摩擦学检验,研究了用于元素和相组成,化学结合状态,质地,残余应力,硬度,粘附和摩擦力,硬度,粘附和摩擦学行为,以及摩擦学检验。通过使用1或2阴极获得各种基板电流密度(在2-7mA / cm 2 )中,而不同的离子能由基板负偏置电压的变化(在范围内)产生50 - 200 v)。观察到薄膜的化学键,质地,机械和摩擦学特性,强烈取决于离子轰击条件。发现达到高硬度值(超过40GPa)和优异的耐磨性的主导因素是基板电流密度。

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