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A high-speed 2×VDD output buffer with PVTL detection using 40-nm CMOS technology

机译:具有使用40nm CMOS技术的具有PVTL检测的高速2×VDD输出缓冲器

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摘要

Not only PVT detection techniques but also a leakage compensation design are proposed to carry out 650/500 MHz 2×VDD output buffer in this paper. The proposed 2×VDD output buffer contains a novel PVTL (Process, Voltage, Temperature, Leakage) compensation circuit to resolve the problems in output buffers of nano-scale CMOS technologies. Particularly, the leakage compensation design is realized by an asynchronous control method to control current paths such that the switching loss and the slew rate in the output buffer can be reduced and increased, respectively. The proposed design has been realized and implemented by using a typical 40 nm CMOS process. The data rate is 650/500 MHz given 0.9/1.8 V supply voltage with a 20 pF load. The maximum slew rate is 3.5 (V/ns), and the core area is 0.052 × 0.213 mm.
机译:不仅提出了PVT检测技术,还提出了泄漏补偿设计,以便在本文中执行650/500MHz 2×VDD输出缓冲器。所提出的2×VDD输出缓冲器包含新型PVTL(工艺,电压,温度,泄漏)补偿电路,用于解决纳米级CMOS技术的输出缓冲器中的问题。特别地,通过异步控制方法实现泄漏补偿设计来控制电流路径,使得可以分别减小和增加输出缓冲器中的开关损耗和转换速率。通过使用典型的40nm CMOS工艺实现和实现所提出的设计。数据速率为650/500 MHz,给出0.9 / 1.8 V电源电压,20 PF负载。最大转换速率为3.5(v / ns),核心区域为0.052×0.213 mm。

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