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Ti-contacted halide-assisted CVD grown WSe_2 monolayers for high performance photodetectors

机译:用于高性能光电探测器的Ti接触式卤化物辅助CVD种植WSE_2单层

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Transition metal dichalcogenides (TMDCs) have received a great deal of attention from the scientific community since the advent of graphene. Tungsten diselenide (2H-WSe_2) has particularly drawn-out attention of researchers because of its broadband spectral detection range. In this work, we have reported a halide assisted chemical vapor deposition (HA-LPCVD) technique for synthesis of large crystallites of 2H-WSe_2 with high crystalline perfection. The average crystallite size of synthesized 2H-WSe2 was in the order of ~20 μm. We have reported device 2H-WSe_2 device fabrication using poly (methyl methacrylate) and electron beam lithography process to define titanium (Ti) metal contacts. A temperature (T) dependent analysis of the electronic transport reported here reveals a T-dependent conduction process existing at the interface of Ti and 2H-WSe_2 and an interfacial barrier height of ~ 0.35 eV was calculated at the thermionic emission regime. From the reported optoelectronic characterization, an on-off ratio (I_(on)/I_(off)) of ~9 was calculated. Furthermore, a responsivity (R) of ~ 242 A/W was calculated for our 2H-WSe_2 based photodetector under broadband light excitation. The reported photodetector figures of merit will open avenues for use of monolayer 2H-WSe_2 with Ti metal contacts for high performance photodetection.
机译:过渡金属二甲基甲基生物(TMDC)自石墨烯的出现以来,从科学界得到了大量的关注。由于其宽带光谱检测范围,钨蛋白酶(2H-WSE_2)特别引起了研究人员的关注。在这项工作中,我们报道了卤化物辅助化学气相沉积(HA-LPCVD)技术,用于合成2H-WSE_2的大晶体,具有高结晶完美。合成的2H-WSE2的平均微晶尺寸为约20μm。我们已经报道了使用聚(甲基丙烯酸甲酯)和电子束光刻工艺制备的装置2H-WSE_2器件制备,以限定钛(TI)金属触点。本文报道的电子传输的温度(t)依赖性分析显示在Ti和2H-WSE_2界面处存在的T依赖性导通过程,并且在热量发射状态下计算〜0.35eV的界面阻挡高度。从报告的光电表征,计算〜9的开关比率(I_(上)/ I_(off))。此外,在宽带光激励下,计算了基于2H-WSE_2的光电探测器的响应值(R)。报告的光电探测器图的优点将打开与单层2H-WSE_2使用Ti金属触点的途径,用于高性能光电检测。

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