The Prelimniary Investigation of Octrafluorocyclobutane Plasma Jet Etching of Crystalline Silicon

摘要

A capacitive coupled radio frequency double-pipe atmospheric-pressure plasma jet is used for the etching process in fabricating Micro Electro Mechanical Systems. Etchings were carried out on a crystalline silicon substrate. The etching rates can be controlled by the etch gas composition and the plasma conditions.