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Investigating Scattering effects in Nano-scale Double Gate MOSFETs by Using Direct Solution of the Boltzmann Transport Equation and Poisson-Schrodinger Equation Method

机译:使用Boltzmann运输方程和泊松 - 施罗格方程方法的直接解决方案来研究纳米级双栅MOSFET中的散射效果

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As gate length of MOSFETs scaling down to nano-scale, both quantization and quasi ballistic transport becomes obviously. Ballistic transport approaches can account in a fairly natural way for quantum mechanical effects[1,2], however scattering still influences the ON currents of nano-scale devices[3]. In nano-scale MOSFETs, the dimensionality is reduced due to the quantum confinement; it is possible to directly solve the BTE and to couple it to the Schrodinger equation [4-6]. However, relaxation time approximation is used to dealing with the scattering effect in recent works[4-6]. In this work the lattice scattering is carefully involved in a direct solution of the BTE and Poisson-Schrodinger equation method [7]. Scattering effects in nano-scale double gate (DG) MOSFET are evaluated.
机译:作为MOSFET的栅极长度缩放到纳米级,量化和准弹道传输都变得明显。弹道传输方法可以以相当自然的方式为量子机械效应[1,2],然而散射仍然影响纳米级装置的电流[3]。在纳米尺度MOSFET中,由于量子限制,维度降低;可以直接解决BTE并将其延长到Schrodinger方程[4-6]。然而,宽松时间近似用于处理近期作品中的散射效果[4-6]。在这项工作中,仔细涉及BTE和Poisson-Schrodinger方程方法的直接解决方案的格子散射[7]。评估纳米级双栅极(DG)MOSFET中的散射效果。

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