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Carrier Transport mechanisms contributing to the sub-threshold current in 3C-SiC-on-Si Schottky Barrier Diodes

机译:载流子传输机制有助于3C-SiC-on-Si肖特基势垒二极管中的亚阈值电流

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摘要

3C-Silicon Carbide (3C-SiC) Schottky Barrier Diodes on silicon (Si) substrates (3C-SiC-on-Si) seem not to comply with the superior wide band gap expectations in terms of excessive measured sub-threshold current. In turn, that is one of the factors which deters their commercialization. Interestingly, the forward biased part of the Current-Voltage (I-V) characteristics in these devices carries considerable information about the material quality. In this context, an advanced Technology Computer Aided Design (TCAD) model for a vertical Platinum/3C-SiC Schottky power diode is created and validated with measured data. The model includes defects originating from both the Schottky contact and the hetero-interface of 3C-SiC with Si which allows the investigation of their impact on the magnification of the sub-threshold current. For this, barrier lowering, quantum field emission and trap assisted tunneling of majority carriers need to be considered at the non-ideal Schottky interface. The simulation results and measured data allowed for the comprehensive characterization of the defects affecting the carrier transport mechanisms of the forward biased 3C-SiC on Si power rectifier for the first time.
机译:硅(Si)基板上的3C碳化硅(3C-SiC)肖特基势垒二极管(Si上3C-SiC)似乎未达到超宽带隙预期,这是因为测量到的亚阈值电流过大。反过来,这是阻碍其商业化的因素之一。有趣的是,这些设备中电流电压(I-V)特性的正向偏置部分携带了有关材料质量的大量信息。在这种情况下,针对垂直铂/ 3C-SiC肖特基功率二极管创建了先进的技术计算机辅助设计(TCAD)模型,并使用测量数据进行了验证。该模型包括源自肖特基接触和3C-SiC与Si异质界面的缺陷,这使得可以研究其对亚阈值电流放大率的影响。为此,需要在非理想的肖特基界面上考虑降低势垒,量子场发射和陷阱辅助的多数载流子隧穿。仿真结果和实测数据首次全面表征了影响正偏3C-SiC硅载流子载流子传输机制的缺陷。

著录项

  • 来源
    《》|2018年|169-173|共5页
  • 会议地点 Xian(CN)
  • 作者单位

    Faculty of Engineering, Environment and Computing, Coventry University, Coventry, UK;

    Faculty of Engineering, Environment and Computing, Coventry University, Coventry, UK;

    Faculty of Engineering, Environment and Computing, Coventry University, Coventry, UK;

    Faculty of Engineering, Environment and Computing, Coventry University, Coventry, UK;

    Department of Electrical and Electronic Engineering, University of Warwick, Coventry, UK;

    Department of Engineering, University of Cambridge, Cambridge, UK;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Silicon; Schottky barriers; Silicon carbide; Schottky diodes; Tunneling; Computational modeling; Electron traps;

    机译:硅;肖特基势垒;碳化硅;肖特基二极管;隧道效应;计算模型;电子陷阱;;
  • 入库时间 2022-08-26 14:32:27

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