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Influence of deposition temperature of ZnO thin films for self powered wearable fabrics using ALD

机译:ZnO薄膜沉积温度的影响使用ALD自动耐磨织物

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Zinc oxide thin films are becoming increasingly popular for their wide range of properties and the ability to deposit these films on organic substrates for applications such as biotemplating, OLEDs, or deposition on fabrics for functionalization purposes including power generation from the flexing and deformation of wearable textiles. However, since many fabrics and other organic substrates can not survive the typically high temperatures of thin film growth, it is important to characterize and understand the dependence of the properties of these films as a function of temperature deposition and subsequent thermal treatments. We report on the properties of zinc oxide thin films grown by Atomic Layer Deposition (ALD) and the dependence of, surface roughness, film stress, surface energy and crystalline structure on deposition temperature.
机译:氧化锌薄膜越来越受欢迎,可以越来越受到各种性质,并且在有机基材上沉积在有机基材上的能力,例如生物型,OLED或在织物上沉积的官能化目的,包括从可穿戴纺织品的弯曲和变形的发电 。 然而,由于许多织物和其他有机基质不能存活较大的薄膜生长的高温,因此表征和理解这些膜的性质的依赖性作为温度沉积和随后的热处理的函数。 我们报告了由原子层沉积(ALD)生长的氧化锌薄膜的性质及表面粗糙度,薄膜应力,表面能和晶体结构在沉积温度上的依赖性。

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