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The effect of magnetic impurity (Mn-manganese) incorporation in Bi_2Se_3 topological insulator

机译:磁杂质(Mn-锰)掺入在Bi_2se_3拓扑绝缘体中的影响

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Bi_2Se_3 is one of the prominent material for Topological Insulator. Bi_2Se_3 and 8% Mn doped Bi_2Se_3 (i.e. Bi_(1.6)Mn_(0.4)Se_3) samples have been grown using a solid state reaction method. Characterization have been done for their structural, elemental, electrical-transport and magnetic properties. High resolution x-ray diffraction (HR-XRD) data revels both the samples have rhombohedral layered structure with space group (R3m). Metallic behavior is observed from resistivity variation with temperature curve in case of un-doped Bi_2Se_3 in the temperature range 16-300K, but a clear up-turn at low temperature is seen for Bi_(1.6)Mn_(0.4)Se_3. Metallic behavior in Bi_(1.6)Mn_(0.4)Se_3 is observed above 45 K, but below 45K, semiconducting/insulating behavior has been observed due to the effect of magnetic impurity. Vibrating sample magnetometry (VSM) measurement revels Bi_2Se_3 is diamagnetic and Bi_(1.6)Mn_(0.4)Se_3 shows an anti-ferromagnetic behavior in the temperature range 8_300K. From this investigation one can understand how magnetic impurity doping tuned the properties of conventional Topological Insulators.
机译:Bi_2se_3是拓扑绝缘体的突出材料之一。 Bi_2Se_3和8%Mn掺杂Bi_2se_3(即Bi_(1.6)Mn_(0.4)Se_3)样品使用固态反应方法生长。已经为其结构,元素,电阻和磁性进行了表征。高分辨率X射线衍射(HR-XRD)数据陶醉样品均具有空间组(R3M)的菱形层状结构。在温度范围为16-300K中的未掺杂Bi_2Se_3的情况下,从电阻率变化观察到金属行为,但是对于Bi_(1.6)Mn_(0.4)SE_3,可以看到低温下的透明上转。在45 k上方观察到Bi_(1.6)Mn_(0.4)Se_3中的金属行为,但由于磁杂质的效果,已经观察到半导体/绝缘行为以下。振动样品磁体(VSM)测量Revels Bi_2Se_3是二磁性的,Bi_(1.6)Mn_(0.4)SE_3显示在8_300K的温度范围内的抗铁磁行为。从这次调查中,人们可以了解赋予磁性杂质掺杂如何调整常规拓扑绝缘体的性质。

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