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Al_2O_3-Based Capacitor-Less Conductive-Bridge Neuron Having Negative-Differential-Resistance

机译:基于AL_2O_3的电容器较低的导电桥神经元,具有负差分电阻

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Recently, memristive devices (e.g. CBRAM and ReRAM etc.) have been proposed as an alternative to C-MOSFET based neuromorphic device (i.e. neuron and synapse) to achieve a high neuronal density and low power consumption. Among memristive devices, the conductive bridge neuron has been a great attention due to its area efficiency, low power consumption (< 500 fJ), and good C-MOS compatibility. However, past researches have mainly focused on stochastic nature of conductive-bridge neurons. In particular, most of the stochastic conductive-bridge neuron have used capacitors to implement membrane potential, which requires a large integration area (~1000F~2). In this works, integrate property of Al_2O_3-based cap-less conductive-bridge neuron was demonstrated which allows a cost-efficient neuromorphic chip by using a same process technology as a memristor synapse, as shown in Fig 1 (a). Note that the Al_2O_3-based cap-less conductive-bridge neuron was the same as that of the Al_2O_3-based memristor synapse. In addition, we investigated the effect of negative-differential-resistance (NDR) characteristic on integrate property for our proposed neuron, depending on the compliance current level (i.e. a shape of metallic filaments in neuron device).
机译:最近,已经提出了忆故器件(例如CBRAM和RERAM等)作为基于C-MOSFET的神经晶体装置(即神经元和突触)的替代方案,以实现高神经元密度和低功耗。在椎间盘装置中,导电桥神经元由于其面积效率,低功耗(<500 FJ)和良好的C-MOS兼容性而受到极大的关注。然而,过去的研究主要集中在导电桥神经元的随机性质上。特别地,大多数随机导电桥神经元使用电容器来实现膜电位,这需要大集成面积(〜1000f〜2)。在此作品中,对基于AL_2O_3的缩略型导电桥神经元的整合性质进行了说明,其允许通过将相同的工艺技术作为忆晶突触相同的过程技术,如图1(a)所示。请注意,基于AL_2O_3的缩小帽导电桥神经元与基于AL_2O_3的Memristor Synapse相同。此外,我们研究了负差异抗性(NDR)特征对我们所提出的神经元的整合性质的影响,这取决于合规电流水平(即神经元装置中金属长丝的形状)。

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