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The Stress Driven Rearrangement Instabilities in Electronic Materials and in Helium Crystals

机译:电子材料和氦气晶体中的应力驱动重排稳定性

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At present, there is a consensus that various Stress Driven Rearrangement Instabilities (SDRI) are the implications of the mathematically rigorous theoretical Gibbs thermodynamics. Many applied researchers and practitioners believe that SDRI are also universal physical phenomena occurring over a large range of length scales and applied topics. There is a multitude of publications claiming experimental observation of the SDRI based phenomena. This opinion is challenged by other highly respected scholars claiming theoretical inconsistencies and multiple experimental counterexamples. Such an uncertainty is too costly for further progress on the SDRI topic. The ultimate goal of our project is to resolve this controversy. The project includes experimental, theoretical, and numerical studies. Among various plausible manifestations of SDRI, the authors focused only on two most promising for which the validity of the SDRI has already been claimed by other researchers: a) stress driven corrugations of the solid-melt phase interface in macroscopic quantum ~4He and b) the dislocation-free Stranski-Krastanov pattern of growth of semiconductor quantum dots. We devised a program and experimental set-ups for testing applicability of the SDRI mechanisms using the same physical systems as before but using implications of the SDRI theory for 2D patterning which have never been tested in the past.
机译:目前,有一种共识,即各种应力驱动的重排稳定性(SDRI)是数学上严谨的理论吉布斯热力学的影响。许多应用的研究人员和从业者认为SDRI也是在大范围的长度和应用主题上发生的普遍物理现象。据称对基于SDRI现象的实验观察,存在众多出版物。这种意见受到索取理论不一致和多个实验对抗的其他高度尊敬的学者挑战。这种不确定性对于SDRI主题进一步进展来说太昂贵了。我们项目的最终目标是解决这一争议。该项目包括实验性,理论和数值研究。在SDRI的各种合理表现中,作者仅关注其其他研究人员已经申请的最高有效性的最有效性:a)宏观量子〜4he和b的固体熔体相界面的应力驱动波纹。半导体量子点的生长的无错斯特拉斯坦模式。我们设计了一种程序和实验组,用于使用相同的物理系统测试SDRI机制的适用性,如以前,但使用SDRI理论对2D图案的影响,这在过去从未进行过测试。

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