首页> 外文会议>OMTAT 2013;International Conference on Optoelectronic Materials and Thin Films >Thickness Dependent Structural, Optical and Electrical Properties of CuIn_(0.8)Ga_(0.2)Se_2 Thin Films Deposited by Pulsed Laser Deposition
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Thickness Dependent Structural, Optical and Electrical Properties of CuIn_(0.8)Ga_(0.2)Se_2 Thin Films Deposited by Pulsed Laser Deposition

机译:Cuin_(0.8)Ga_(0.2)Se_2的Cuin_(0.8)Ga_2的光学和电性能的厚度依赖性结构,光学和电性能通过脉冲激光沉积沉积

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CuIn_(0.8)Ga_(0.2)Se_2 (CIGS) polycrystalline thin films have been deposited on soda lime glass substrate at different deposition time by pulsed laser deposition. The effect of thickness on structural, surface morphological, optical and electrical properties of thin films were investigated by X-ray diffractometer (XRD), field emission scanning electron microscope (FESEM), atomic force microscopy (AFM), UV-Vis-NIR spectrophotometer and electrical measurement unit. XRD study reveals that all deposited films are polycrystalline in nature and have tetragonal phase of CIGS. Crystallinity of CIGS films has been found to improve with increase in thickness of CIGS films as evidenced by sharp XRD peaks for (112) orientation. Grain size and rms surface roughness of CIGS films have been found to be increased with increase in thickness. All the deposited CIGS films exhibit direct band gap semiconducting behaviour with ~10~6 cm~(-1)absorption co-efficient. Optical band gap and resistivity of CIGS films have been found to decrease with increase in thickness.
机译:Cuin_(0.8)Ga_(0.2)SE_2(CIGS)通过脉冲激光沉积在不同的沉积时间上沉积在苏打石灰玻璃基板上的多晶薄膜。通过X射线衍射仪(XRD),场发射扫描电子显微镜(FESEM),原子力显微镜(AFM),UV-Vis-Nir分光光度计研究厚度对薄膜结构,表面形态,光学和电性能的影响,表面形态,光学和电性能和电气测量单元。 XRD研究表明,所有沉积的薄膜本质上是多晶,并且具有CIGS的四方相。已经发现CIGS膜的结晶度随着CIGS膜的厚度的增加而改善,其尖锐的XRD峰值(112)取向而证明。已经发现CIGS膜的晶粒尺寸和RMS表面粗糙度随着厚度的增加而增加。所有沉积的CIG膜都表现出直接带隙半导体行为,〜10〜6cm〜(-1)吸收共同高效。已发现CIGS膜的光带间隙和电阻率随着厚度的增加而降低。

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