Study and fabrication of maximum operating frequency of SAW filters as using I-line source

摘要

In this work, the unbalance structure technique has been studied in detail. The maximum operating frequency is limited by the gap width of the SAW filter but independent of the line width. The MOF is around 27/40 times acoustic wave velocity/the gap width. Using the I-line lithography, the gap width of 0.35 μm can be easily defined. MOF of more than 7 GHz could be achieved. The near field phase shift photolithography has the potential to fabricate the SAW devices with the nano-gap width. The NFPSL could have the potential to fabricate the SAW filter with more than 27 GHz operating frequency when using I-line light source.