Coating Deposition by Condensing the Particle Flux from the Target Sputtered in the Low-Pressure Arc Plasma

摘要

The method under study is based on the use of two particle flows of different origin being condensed. One of the them is the erosion plasma flow generated by the cathode spot of the vacuum arc in the magnetic focusing source. The other flow comprises the vapours of target material subjected to sputtering by ions of the first flow. Compared to the conventional cathodic-arc method, the method considered here has the following advantages: the resulting coatings have a smoother surface; the area of deposition with a coating uniform in thickness can be extended by more than an order of magnitude; the method provides a significant surface temperature reduction in the coating formation region.