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Joint Optimization of Apodizer and Lyot stop for Coronagraph with Four-Quadrant Phase Mask

机译:具有四象次相位掩模的胰胶质菌的联合优化

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Exploring exoplanets using stellar coronagraph requires coronagraph with a contrast of 10~(-10) or even lower, because the difference in light intensity between the planet and its parent star is very large. To this end, we optimized the coronagraph imaging system with Four-Quadrant Phase-Mask (FQPM) proposed by D. ROUAN et al in 2000. The FQPM has the advantages of high extinction efficiency for the coherent light from the main source, low sensitivity to atmospheric turbulence and large dynamic range. This paper proposed an apodizer with continuous transmission and a Lyot stop optimized in conjunction with the apodizer for FQPM coronagraph, which enhance the nulling ability of FQPM to achieve a high contrast ratio of 10~(-12) at 1.25λ/D and a contrast of 10~(-13) at larger distance. Moreover, this optimization method can optimize the non-circular symmetric mask, that is, the optimization method is two-dimensional, rather than one-dimensional optimization in the case of circular symmetry. Then we compare the joint optimization with the optimization of the apodizer only, the results show that the former has better diffraction suppression and concentrating ability than the latter, which makes the energy more concentrated and the peak signal obtained on the detector is stronger. In the follow-up work, we will continue to complete the FQPM coronagraph system, such as adding adaptive optical to correct wavefront distortion, adding considerations for manufacturing precision of optical components and so on.
机译:使用Stellar Coronagraph探索EXOPLANETER需要对比度为10〜( - 10)甚至更低的核糖,因为行星和其父颗星之间的光强度差异非常大。为此,我们优化了2000年D. Rouan等人提出的四象次相位面罩(FQPM)的调节成像系统。FQPM具有来自主要来源的相干光的消光效率高的优点,低灵敏度大气湍流和大动态范围。本文提出了一种具有连续透射的映射,并与用于FQPM癌的吸引力优化的Lyot停止,这提高了FQPM的缺点能力,以在1.25λ/ d处实现10〜(-12)的高对比度。和对比度10〜(-13)距离较大。此外,该优化方法可以优化非圆对称掩模,即优化方法是二维,而不是循环对称的一维优化。然后我们仅比较了同时的优化的联合优化,结果表明,前者具有比后者更好的衍射抑制和集中能力,这使得能量更集中,并且在检测器上获得的峰值信号更强。在后续工作中,我们将继续完成FQPM调节系统,例如添加自适应光学以纠正波前失真,为光学元件的制造精度添加考虑因素等。

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