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Electrical and optical properties of graphene oxide modified by nitrogen and methane plasma

机译:通过氮气和甲烷等离子体改性石墨烯氧化物的电气和光学性质

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The current-voltage (I-V) characteristic and photoresponse of partially reduced graphene oxide (rGO) treated with nitrogen and methane plasmas have been studied. Measurements of I-V characteristics showed that the illumination (incandescent lamp) of samples after plasma exposure leads to the appearance of a bend in the initially linear characteristic. The difference in the value of the currents with the illumination turned on and off was up to 100 μA at a voltage of ±10 V. The relaxation time of the process is about 1 s. The observed effect depends on the plasma processing conditions, as well as on the thickness of the films. The largest values of the photoresponse was observed at thicknesses of GO films from 20 nm to 60-80 nm.
机译:已经研究了用氮气和甲烷等离子体处理的部分还原的石墨烯(RGO)的电流电压(I-V)特征和光响应。 I-V特性的测量表明,等离子体暴露后样品的照明(白炽灯)导致最初线性特性的弯曲的外观。在±10 V的电压下,导通和关闭电流的电流值的差异高达100μA。该过程的松弛时间约为1。观察到的效果取决于等离子体加工条件,以及薄膜的厚度。在20nm至60-80nm的Go膜的厚度下观察光孔的最大值。

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