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Impact of thermal treatment on the residual stress and Young's modulus of thin a-SiC:H membranes applying bulge testing

机译:热处理对薄A-SiC的残留应力和杨氏模量的影响:H膜应用凸起测试

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Silicon carbide (SiC) as a wide bandgap semiconductor features outstanding electrical and mechanical properties as well as enhanced inertness against a large variety of chemical substances and a high temperature stability. Therefore, it is the material of choice for high performance microelectromechanical systems. This study presents the impact of thermal treatment on a 500 nm thin hydrogenated amorphous SiC membrane. Layers were synthesized using an inductively-coupled plasma-enhanced chemical vapour deposition equipment and processed to obtain circular diaphragms. Bulge testing is performed with a uniformly applied pressure load and the bending characteristics as well as the flexural Young's modulus and residual tensile stress are determined. With increasing annealing temperature a massive increase of membrane stress and only a slight increase of Young's modulus occurs while the bending characteristic of the diaphragm is a nearly perfect membrane type independent of thermal loading.
机译:碳化硅(SIC)作为宽带隙半导体,具有出色的电气和机械性能,以及针对各种化学物质的增强惰性和高温稳定性。因此,它是高性能微机电系统的首选材料。本研究提出了热处理对500nm薄氢化无定形SiC膜的影响。使用电感耦合等离子体增强的化学气相沉积设备合成层,并加工以获得圆形隔膜。通过均匀施加的压力负载和弯曲特性以及弯曲杨氏模量和残留拉应力进行凸起测试。随着退火温度的增加,膜应力的大规模增加,而仅发生杨氏模量的略微增加,而隔膜的弯曲特性是与热负荷无关的几乎完美的膜等。

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