PVT Variations Aware Low Leakage DOIND Approach For Nanoscale Domino Logic Circuits

摘要

For high system performance in VLSI chips dynamic CMOS logic circuit techniques are used. As continue scaling down the dimension of transistors parameter variation becomes a serious issue in very deep sub-micron regime. The overall performance of any logic circuit reduces by increasing leakage current and variability of parameters in scaled device. To overcome the variability issue in sub-micron regime the design must be aware of variations. In this paper DOIND logic approach is proposed for domino logic to analyze the variability issue. This approach reduces leakage current as well as it reduces the variability issue with minimum delay penalty. Various process, voltage and temperature (PVT) variations are analyzed at 70 nm technology node for a domino logic and DOIND logic buffer using tanner EDA tool. Simulation result shows that DOIND approach has less affect of PVT variations as compare to domino logic circuit.