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Dielectric and Ferroelectric Properties of Er_2O_3-doped Bi_4Ti_30_(12) Thin Films

机译:ER_2O_3掺杂BI_4TI_30_(12)薄膜的介电和铁电性能

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Er_2O_3-doped bismuth titanate (Bi_(4-x)Er_xTi_3O_(12), BET) and pure Bi_4Ti_3O_(12) (BIT) thin films with random orientation were fabricated on Pt/Ti/SiCVSi substrates by rf magnetron sputtering technique. These samples had polycrystalline Bi-layered perovskite structure without preferred orientation, and consisted of well developed rod-like grains with random orientation. Er-doping into BIT caused a large shift of the Curie temperature ( T_c ) from 675 °C to lower temperature and a improvement in dielectric property. The experimental results indicated that Er doping into BIT also result in a remarkable improvement in ferroelectric property. The P_r and the E_c values of the BET film with x=0.75 were 21 μC/cm~2 and 80 kV/cm, respectively.
机译:通过RF磁控溅射技术在Pt / Ti / SiCVSI基板上制造具有随机取向的钛酸盐(Bi_(4-x)ER_XTI_3O_(12),BET)和纯BI_4TI_3O_(12)(钻头)薄膜。这些样品具有没有优选取向的多晶双层钙钛矿结构,并且由具有随机取向的良好发育的杆状晶粒组成。 ER-掺杂进入位引起居里温度(T_C)从675℃变化到较低的温度和介电性的改善。实验结果表明,ER掺杂进入钻头也导致铁电性能显着改善。 BET膜的P_R和X = 0.75的E_C值分别为21μC/ cm〜2和80kV / cm。

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