首页> 外文会议>Workshop on Synthesis, Characterization and Applications of Inorganic Powders >Electrical Characterization and Microstructures of Bi_(3.25)Er_(0.75)Ti_3O_(12) and Bi_(2.9)Er_(0.75)Ti_(2.97)V_(0.03)O_(12) Thin Films
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Electrical Characterization and Microstructures of Bi_(3.25)Er_(0.75)Ti_3O_(12) and Bi_(2.9)Er_(0.75)Ti_(2.97)V_(0.03)O_(12) Thin Films

机译:Bi_(3.25)ER_(0.75)TI_3O_(12)和BI_(2.9)ER_(0.75)TI_(2.97)V_(0.03)O_(12)薄膜的电气表征和微观结构

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Bi_(3.25)Er_(0.75)Ti_3O_(12) (BET) and Bi_(2.9)Er_(0.75)Ti_(2.97)V_(0.03)O_(12) (BETV) thin films with random orientation were fabricated on Pt/Ti/SiO_2/Si substrates by rf magnetron sputtering technique. These samples had polycrystalline Bi-layered perovskite structure without preferred orientation, and consisted of well developed rod-like grains with random orientation. The experimental results indicated that Er doping into Bi_4Ti_3O_(12) (BIT) also result in a remarkable improvement in ferroelectric property. The remanent polarization (P_r) and coercive field (E_c) of the BET film were 17 μC/cm~2 and 80 kV/cm, respectively. Furthermore, V substitution improves the Er value of the BETV films up to 28 μC/cm~2, which is much larger than that of the BET film.
机译:Bi_(3.25)ER_(0.75)TI_3O_(12)(BIB)和BI_(2.9)ER_(0.75)TI_(2.97)V_(0.03)O_(12)(BETV)在PT / TI上制造了随机取向的薄膜/ SiO_2 / SI基板通过射频磁控溅射技术。这些样品具有没有优选取向的多晶双层钙钛矿结构,并且由具有随机取向的良好发育的杆状晶粒组成。实验结果表明,ER掺杂到BI_4TI_3O_(12)(位)也导致铁电性能显着改善。 BET膜的剩磁极化(P_R)和矫顽磁场(E_C)分别为17μC/ cm〜2和80kV / cm。此外,V替换改善了高达28μC/ cm〜2的βV薄膜的ER值,其远大于BET薄膜。

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