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Growth of Thin Film Containing High Density ZnO Nanorods with Low Temperature Calcinated Seed Layer

机译:含有低温煅烧种子层的高密度ZnO纳米棒的薄膜生长

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In this work we demonstrate the growth of thin film containing high density ZnO nanorods by using drop casting of the seed layer calcinated at a low temperature of 132 °C. Chemical bath deposition (CBD) method is used to grow the nanorods. X-ray diffraction (XRD) analysis and Field Emission Scanning Electron Microscopy (FESEM) are performed for the structural and morphological characterizations of the nanorods. The average diameter and length of nanorods are found to be 33 nm and 270 nm respectively. The bandgap of the material is estimated to be 3.2 eV from the UV-Visible absorption spectroscopy. The reported method is much more cost-effective and can be used for growth of ZnO nanorods for various applications.
机译:在这项工作中,我们通过使用在132℃的低温下煅烧的种子层的下降铸件来证明含有高密度ZnO纳米棒的薄膜的生长。化学浴沉积(CBD)方法用于生长纳米棒。 X射线衍射(XRD)分析和场发射扫描电子显微镜(FESEM)进行纳米棒的结构和形态表征。发现纳米棒的平均直径和长度分别为33nm和270nm。从UV可见吸收光谱估计材料的带隙是3.2eV。报告的方法更具成本效益,可用于各种应用的ZnO纳米棒的生长。

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