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Preparation and Atomic Force Microscopy of CTAB stabilized Polythiophene Nanoparticles Thin Film

机译:CTAB稳定聚噻吩纳米粒子薄膜的制备和原子力显微镜

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Polythiophene nanoparticles were synthesized by iron catalyzed oxidative polymerization method. Polythiophene formation was detected by UV-Visible spectroscopy with Xmax 375nm.Thin films of CTAB stabilized polythiophene nanoparticles was deposited on n-type silicon wafer by spin coating technique at 3000rpm in three cycles. Thickness of the thin films was computed as 300-350nm by ellipsometry. Atomic force micrscopyrevealws the particle size of polymeric nanoparticles in the range of 30nm to 100nm. Roughness of thinfilm was also analyzed from the atomic force microscopy data by Picoimage software. The observed RMS value lies in the range of 6 nm to 12 nm.
机译:通过铁催化氧化聚合方法合成聚噻吩纳米粒子。通过UV可见光谱法与Xmax 375nm检测聚噻吩形成。通过3000rpm的三个循环,通过旋涂技术在N型硅晶片上沉积CTAB稳定的聚噻吩纳米粒子的薄膜。薄膜的厚度通过椭圆形式计算为300-350nm。原子力微探测聚合物纳米颗粒的粒径为30nm至100nm。 ScoImage软件的原子力显微镜数据还分析了薄薄膜的粗糙度。所观察到的rms值位于6nm至12nm的范围内。

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