首页> 外文会议>IEEE Magnetics Conference >Polycrystalline CPP-GMR devices using <001> textured Co2Fe(Ga0.5Ge0.5) Heusler alloy layer and conductive Mg0.5Ti0.5Ox buffer layer
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Polycrystalline CPP-GMR devices using <001> textured Co2Fe(Ga0.5Ge0.5) Heusler alloy layer and conductive Mg0.5Ti0.5Ox buffer layer

机译:多晶CPP-GMR器件使用<001>纹理CO 2 FE(GA 0.5 GE 0.5 )HEUSLER合金层和导电MG 0.5 TI 0.5 O X 缓冲层

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Current-perpendicular-to-plane giant magnetoresistance (CPP-GMR) devices with Co-based Heusler alloys have recently drawn considerable attention due to their potential application as read sensors for ultrahigh density magnetic recording. With a non-magnetic Ag spacer layer, the resistance change-area product (ΔRA) of epitaxial pseudo spin valves (PSVs) on single crystalline (001) MgO substrates has exceeded 10 mΩ μm by using quaternary ferromagnetic (FM) Heusler alloys such as CoFe(GaGe) (CFGG) and CoFeMnSi (CFMS). From a practical point of view, however, we need to develop CPP-GMR sensors with polycrystalline thin films at relatively low annealing temperatures (<;400°C). Our previous work on <;001> textured polycrystalline CPP-GMR using MgO buffer layer showed favorable device thermal stability and moderate ΔRA of 5.8 mΩ μm at 400°C was obtained. Nevertheless, it is not industrially viable because MgO as an insulator cannot be used for the fabrication of the actual CPP-GMR sensors. In this work, we report the CPP-GMR properties and microstructure of PSV devices using <;001> textured FM Heusler layer CFGG and Ag spacer with a conductive buffer layer MgTiO (MTO) deposited on an chemically-mechanically polished (CMP) Ta/Cu/Ta electrode on thermally oxidized Si substrates. Relatively large ΔRA of 6.6 mΩ μm and desirable interfacial smoothness make it a promising candidate for actual read head design.
机译:由于其潜在应用作为超高密度磁记录的读取传感器,具有Co-in-Coursler合金的电流垂直于平面巨大磁阻(CPP-GMR)器件最近引起了相当大的关注。通过非磁性Ag间隔层,通过使用季镍铁磁性(FM)HEUSLER合金(如) cofe(gage)(cfgg)和cofemnsi(cfms)。然而,从实际的角度来看,我们需要在相对低的退火温度(<400°C)下使用多晶薄膜开发CPP-GMR传感器。我们以前的研究<; 001>使用MgO缓冲层的纹理多晶CPP-GMR显示出有利的器件热稳定性,并且获得了400℃下的5.8MΩμm的中等ΔRa。然而,由于绝缘体的MgO不能用于制造实际的CPP-GMR传感器的工业上不可行。在这项工作中,我们使用<001>纹理的FM Heusler层CFGG和AG间隔物报告PSV器件的CPP-GMR性能和微观结构,其中沉积在化学机械抛光(CMP)TA /中的导电缓冲层MGTIO(MTO)/在热氧化Si基材上的Cu / Ta电极。相对大的ΔRa为6.6mΩμm和所需的界面平滑度使其成为实际读头设计的有希望的候选者。

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