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Fano interference between resonant and leaky waves in 1D silicon photonic crystal microcavities

机译:1D硅光子晶体微腔中谐振和漏波之间的扇形干扰

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Resonant integrated optical structures with spectra exhibiting asymmetric Fano line shapes [1] are of interest for a variety of devices, including integrated sensors, electro-optic modulators and all-optical switches. Here we observe such line shapes in the transmission spectra of waveguide-loaded 1D photonic crystal (PC) microresonators, resulting from interference between the resonant transmission of the bus WG's fundamental quasi-TE mode, and leaky nonresonant transmission of a second-order quasi-TE mode through the PC region. The continuum state transmitted through the PC microcavity itself uniquely allows for devices requiring no additional waveguides or reflecting elements [2]. Additionally, the devices are fabricated with 193-nm immersion photolithography in a CMOS memory process at Micron Technology [3], and though PC structures have previously been fabricated photolithographically [4], these are the first high-Q PC microcavity devices fabricated subject to the constraints and dielectric environment of a full electronics-capable CMOS process.
机译:具有表现出不对称扇形线形状的谱的谐振集成光学结构对各种设备感兴趣,包括集成传感器,电光调制器和全光开关。在这里,我们观察波导加载一维光子晶体(PC)微谐振器的透射光谱,例如线形,从总线WG的基本准TE模式的谐振传输,以及第二阶准的漏泄非谐振传输之间的干扰产生的TE模式通过PC区域。通过PC微腔自身传输的连续状态唯一允许无需额外的波导或反射元件的装置[2]。另外,该装置在美光科技制造用在CMOS存储器过程193纳米浸渍光刻[3],并且,虽然PC结构先前已光刻制造[4],这些是第一高Q PC微腔的设备制造受CMOS工艺的限制与介电环境。

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