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The Powerful Combination of Ion-Milling Method for XTEM Preparation: Application to a Diffusion Barrier Coating on Nb Substrate

机译:用于XTEM制备的离子铣削方法的强大组合:在Nb衬底上的扩散阻挡涂层应用

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The sample preparation of coating system for use in a transmission electron microscope (TEM) is a thoroughly challenging process of viewing samples at the nano-level scale. Two different ion milling methods have be taken, argon ion slicer (AIS) and focused ion beam (FIB) which have the ability to reveal many of the characteristics of how thin films form. This Method has been applied to investigate cross-sectional structure of Re-based diffusion barrier coating on Nb substrate. The detailed micro-nano structure of coating specimen presented several crystal defects such as dislocations, stacking faults, voids and cracks.
机译:用于透射电子显微镜(TEM)用于透射电子显微镜(TEM)的涂布系统的样品制备是在纳米水平尺度处观察样品的彻底挑战性过程。已经采取了两种不同的离子铣削方法,氩离子切片机(AIS)和聚焦离子束(FIB)具有揭示薄膜形式的许多特征的能力。该方法已经应用于研究Nb衬底上基于RE的扩散阻挡涂层的横截面结构。涂层标本的详细微纳米结构呈现了几种晶状体缺陷,例如位错,堆叠故障,空隙和裂缝。

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