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Studies on the preparation and characterization of ferroelectric PLZT film capacitors

机译:铁电PLZT薄膜电容器的制备与表征研究

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(Pb(0.92)La(0.08))(Zr0.65Ti(0.35))O3(PLZT) thin films were fabricated on indium-doped tin oxide (ITO)-coated glass substrates to create transparent capacitor by the sol-gel method following annealing process. X-ray diffraction analysis shows that the PLZT thin films are polycrystalline with a single perovskite phase at 650C. The ferroelectric, electrical and optical properties of these films were investigated in detail as a function of annealing temperature. Measurements with the PLZT films annealed at 650°C yielded the following: relative permittivity=775 and dielectric loss (tanδ)=0.054, leakage current of 7.1×10-9A, and remanent polarization of 38 μC/cm2 and the coercive electric field of 55 kV/cm and transparency of 88%. The pure perovskite films exhibit better properties than those films which have some fraction of pyrochlore phase.
机译:(Pb(0.92)La(0.08))(Zr0.65Ti(0.35))O3(PLZT)薄膜在掺杂掺杂的氧化锡(ITO)涂覆的玻璃基板上制造,以通过溶胶 - 凝胶方法制造透明电容器退火过程。 X射线衍射分析表明,PLZT薄膜是在65℃下具有单钙钛矿相的多晶。将这些膜的铁电,电气和光学性质详细研究了退火温度的函数。在650℃下退火的PLZT薄膜的测量结果如下:相对介电常数= 775和介电损耗(Tanδ)= 0.054,漏电流为7.1×10-9A,并熔化极化为38μC/ cm2和矫顽电场55 kV / cm,透明度为88%。纯钙钛矿薄膜表现出比具有含有一分的纤维相的薄膜的性能更好。

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