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Post Annealing Temperature Effect on Photoluminescence Spectroscopy of ZnO Thin Film

机译:ZnO薄膜光致发光光谱的发出温度效应

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This paper reports on the effect of annealing temperature on the photoluminescence (PL) properties of ZnO thin film. Sol-gel spin coating method was used to prepare the ZnO templates on silicon substrate. ZnO thin films were then deposited by thermal chemical vapor deposition technique by using Zinc Acetate dihydrate as a precursor. Deposited films are annealed at various temperatures; from 650°C to 850°C for 1 hour. The effect of annealing on the optical, structure and electrical properties is investigated. FE-SEM images shows sizes of ZnO nanothorn encapsulate in balls changes as the annealing temperature increased. The optical properties were characterized using photoluminescence (PL) spectrometer with 325nm UV light from a He-Cd laser at room temperature and the electrical properties were characterized using Current-Voltage (I-V) measurement.
机译:本文报道了退火温度对ZnO薄膜光致发光(PL)性质的影响。使用溶胶 - 凝胶旋涂方法在硅衬底上制备ZnO模板。然后通过使用醋酸锌二水合物作为前体通过热化学气相沉积技术沉积ZnO薄膜。沉积的薄膜在各种温度下退火;从650°C至850°C,1小时。研究了退火对光学,结构和电性能的影响。 FE-SEM图像显示Zno纳米封装在球中的大小随着退火温度的增加而变化。使用光致发光(PL)光谱仪表征光学性质,其中来自He-Cd激光器在室温下的325nm UV光,使用电流 - 电压(I-V)测量表征电性能。

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