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Infrared Reflectivity Studies On Composite HfO_(2)/SiO_(2) Thin Films

机译:复合HFO_(2)/ SiO_(2)薄膜的红外反射率研究

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摘要

The HfO_(2)-SiO_(2) composite films were prepared by reactive electron beam co-deposition process with various pre-determined mixing compositions. The films have been characterized by FTIR spectroscopy. IR reflectivity data shows a regular trend with the increase of silica concentration. For low silica concentrations, refractive index shows anomalously hardened value, whereas for low hafnia concentrations, abosorption spectra show the formation of hafnium silicate.
机译:通过具有各种预定混合组合物的反应性电子束共沉积方法制备HFO_(2)-SiO_(2)复合膜。薄膜的特征在于FTIR光谱。 IR反射率数据显示常规趋势随着二氧化硅浓度的增加。对于低二氧化硅浓度,折射率显示出异常硬化值,而对于低铪浓度,吸收光谱显示硅酸盐的形成。

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